薄膜及厚度量測儀(SANFILM/A688-9)

技術規格 Specifications

技術: 單點光譜反射

Technology: Spectral reflection method

量測點大小 : Φ 40 μm (依物鏡倍率)

Spot size : Φ 40 μm (depend on objective)

薄膜厚度範圍 : 20 nm-30 μm (option to 350 μm)

Thickness range : 20 nm-30 μm(option to 350 μm)

厚度重複性 : <1 nm @ 500 nm Oxide on Si substrate

Thickness Repeatability : <1 nm @ 500 nm Oxide on Si substrate

晶圓尺寸 : 12吋 (R-Θ stage)  Wafer size : 12 inch(R-Θ stage)

Vacuum Chuck and color preview camera

內建常用之材料折射率及多層膜設定GUI

Built-in Template (N, K) and Multi-layer Model Setup